Daten zum Projekt

Serial co-sputtering for functional multi component thin films - COSMOS (Extension)

Initiative: Herstellung funktionaler Oberflächen (beendet)
Bewilligung: 09.02.2011
Laufzeit: 2 Jahre


Serial co-sputtering involves several potential benefits compared to conventional magnetron sputtering, namely the enhancement of the deposition rate per power by co-doping with heavy elements, the possibility of a precise rate control by monitoring the material coverage of the rotating target, as well as the possibility of fabricating material compositions that are difficult to provide as conventional alloy target. Further, by modification of the primary target surface composition, process conditions such as target voltage and ion fluxes can be tailored. For these reasons, the project 'Cosmos - Serial co-sputtering for functional multicomponent thin films' has been initiated in which several of the benefits of serial co-sputtering mentioned could be validated. This follow up project aims now to systematically exploit the whole potential of this technology. This involves optimization of the rate enhancement and precision of rate control for technologically relevant materials such as TiO2. But specifically, the full potential of the new technology should now be demonstrated by development of advanced multi-component materials.


  • Dr. Andreas Pflug

    Fraunhofer-Institut für Schicht- und
    Oberflächentechnik (IST)

  • Dr. Tomas Kubart

    Uppsala University
    Ångström Laboratory
    Solid State Electronics

  • Prof. Dr. Matthias Wuttig

    Technische Hochschule Aachen
    I. Physikalisches Institut (IA)
    Lehrstuhl für Physik neuer Materialien