Projekt

This project investigates the deposition of multi-component materials by applying a novel type of magnetron sputtering, namely "serial co-sputtering". The basic principle is sketched as follows: The sputter source consists of a primary rotatable sputter target of material A and a secondary, fixed sputter target of material B. During operation of the primary sputter target, a thin metallic film of the material sputtered from target B is deposited onto its backside. In the primary sputtering process, this film gets implanted into the primary target material A, thereby enabling an increased sputtering rate and/or the metallic or reactive deposition of doped layers with an adjustable doping concentration [B]/[A].The project goal is to establish a sound theoretical understanding of this concept by means of computer simulations and experimental work and to employ this for high rate production of thin film materials with enhanced properties or with even novel phase compositions. As a second objective, the development and implementation of advanced process control techniques will further support the achievement of this goal.

• Dr. Andreas Pflug

  Fraunhofer-Institut für Schicht- und
  Oberflächentechnik (IST)
  Simulation
  Braunschweig
  

• Prof. Sören Berg, Ph.D.

  Uppsala University
  Angström Laboratory
  Solid State Electronics
  Uppsala
  Schweden
  

• Dr. Tomas Nyberg

  Uppsala University
  Angström laboratory
  Uppsala
  Schweden
  

• Prof. Dr. Matthias Wuttig

  Rheinisch-Westfälische
  Technische Hochschule Aachen
  I. Physikalisches Institut (IA)
  Lehrstuhl für Physik neuer Materialien
  Aachen